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Defects in HIgh-k Gate Dielectric Stacks

Nano-Electronic Semiconductor Devices de

Éditeur :

Springer


Collection :

NATO Science Series II: Mathematics, Physics and Chemistry

Paru le : 2006-02-15

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Description
The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. The special feature of this workshop was focus on an important issue of defects in this novel class of materials. One of the key obstacles to high-k integration into Si nano-technology are the electronic defects in high-k materials. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. However, very little is known about the nature of the defects or about possible techniques to eliminate, or at least minimize them. Given the absence of a feasible alternative in the near future, well-focused scientific research and aggressive development programs on high-k gate dielectrics and related devices must continue for semiconductor electronics to remain a competitive income producing force in the global market.
Pages
492 pages
Collection
NATO Science Series II: Mathematics, Physics and Chemistry
Parution
2006-02-15
Marque
Springer
EAN papier
9781402043659
EAN PDF
9781402043673
Informations sur l'ebook
Nombre pages copiables
4
Nombre pages imprimables
49
Taille du fichier
42148 Ko
Prix
210,99 €

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