Télécharger le livre :  Defects in HIgh-k Gate Dielectric Stacks

The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that...
Editeur : Springer
Parution : 2006-02-15
Collection : NATO Science Series II: Mathematics, Physics and Chemistry
Format(s) : PDF
210,99

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